Products & Services

NANO-FABRICATION FOUNDRY SERVICE

Grating Fabrication for DFB/VCSEL Epitaxy Wafer
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Grating Fabrication for DFB/VCSEL Epitaxy Wafer

  • NIL & Photo-litho Process
  • III-V Material Etch
  • Process & Alignment Mark Fabrication
Diffractive Optical Element (DOE) & Metalens
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Diffractive Optical Element (DOE) & Metalens

  • Optical Design Simulation
  • NIL Process
  • Glass/Quartz Material Etch
Photonic Crystal Fabrication
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Photonic Crystal Fabrication

  • Photonic Crystal & Photonic Quasi-crystal Design Simulation
  • NIL & Photo-litho Process
  • III-V Material Etch
Customized Nano-Textured Hybrid Fabrication
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Customized Nano-Textured Hybrid Fabrication

  • Display & Light engine
  • μLED & QD LED
  • Bio-sensing/Detection Template
  • Biomimetic Surface

SERVICE TECHNIQUES & SPECIFICATIONS

Production Scale of NIL
(2" ~ 8" wafer size)
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  • Minimum CD in production: 25nm
  • Fragile & bowling wafers can be applied
  • Workable thickness of wafers: 75 µm ~ 2mm
E-beam Lithography
& Photo Lithography
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  • High-end E-beam tool for NIL mold/master fabrication
  • Process alignment mark fabrication by both of NIL and photo-litho
  • Crystalline alignment along the major flat of wafers: <0.02°
Material EtchOpenClosed
  • Dedicated dry etch tools for different materials
  • Dry etch thickness variation within wafers: ± 3nm
  • Possesses both of dry and wet etch
Nano-structure Design
& Simulation
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  • PWE & FDTD self-developed codes
  • Wavefront engineering designs
  • Photon block & diffracted mode simulation
Accordion visual
Developed by Round Bytes X WebsiteZoo
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Foundry of Hybrid Nanoimproint Lithography
Solution for Material Engineering

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