With two decades of experience in Nanoimprint Lithography (NIL), our team develops world-class patterning process technologies for scalable manufacturing. Since 2007, we have successfully applied NIL to high-volume LED wafers, hard sapphire substrates, and fragile InP laser wafers. Through a uniquely developed hybrid process flow, we have integrated NIL into industry-standard workflows, enabling reliable and repeatable production of nano-structured substrates. By combining NIL with precision alignment, material etching, and photolithography techniques, we broaden its applicability across diverse substrates—laying the foundation for a versatile material engineering foundry platform. Today, we deliver highly customized fine structures and continue advancing our NIL-hybrid process platform toward next-generation quantum applications.
Company Evolution
Pioneer in implementing NIL production
Quantum NIL Corporation (QtNIL) was established in 2022 and is headquartered in Hsinchu Science Park, Taiwan. QtNIL is positioned as a professional manufacturing foundry specializing in hybrid Nanoimprint Lithography (NIL) solutions for advanced material engineering. Leveraging its core NIL technology, QtNIL is committed to serving a broad range of industries, including compound semiconductors, optics, illumination, biomedical applications, and quantum innovation.
Team was born
Team was formed in Mesophotonics Limited, UK
1st NIL production
Built up the 1st NIL production line for LED chip fabrication in Taiwan
NIL in production
NIL for Pattern Sapphire Substrate (PSS) in production - HB GaN LED
NIL in development
NIL on different substrates up to 6" were successfully demonstrated
IQE acquires the team
Team, IP and NIL equipment were acquired by IQE Plc for DFB laser wafer grating fabrication
NIL in production
NIL gratings for InP DFB laser wafers in production
NIL in development
NIL for different laser wafers are under qualification
NIL Foundry
NIL BU independent of IQE Plc
