Nanoimprint Lithography (NIL)
A low-carbon and cost-effective solution
How NIL Works
The process flow behind nano-scale patterning
Press mold
UV/Heat curing
Release mold
Substrate etch
Press mold
UV/Heat curing
Release mold
Substrate etch
Mold
Polymer
Substrate
Nanoimprint Lithography (NIL) is an advanced patterning technique that enables the replication of sub-micrometer structures at the wafer level. It offers a versatile solution that can be applied to virtually any substrate, making it a compelling alternative to conventional lithography technologies such as electron beam (E-beam) and extreme ultraviolet (EUV) lithography.
NIL is particularly well-suited for the following application scenarios:
- Structure resolution below 100 nm
- Use of functional materials or non-silicon substrates
- Hybrid or complex 2D/3D structures with irregular distributions
- Medium-to-small volume production or highly customized fabrication
